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Evaporators and Effusion Cells

Evaporators and
Effusion Cells

CreaTec Effusion Cells are used in ultra-high vacuum (UHV) evaporation systems to generate ultrapure molecular and atomic beams from a large variety of elements and compounds. The different types of effusion cells are manufactured to evaporate almost every material. Refer to selection chart  for a quick guide.

Evaporators

Evaporators and effusion cells from Createc. Operating temperatures can range from: -60 °C to 2400 °C.

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ARC Sciences Pte Ltd

12 Lorong Bakar Batu, #06-07 Singapore 348745

sales@arcsciences.com.sg

+65 6296 7828

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High Temperature Cell (HTC)

HTC is designed to evaporate materials with low vapor pressure at temperatures up to 2000°C and maximum power of 800W. The hot area of the effusion cell is made entirely from tantalum and tungsten with molybdenum as an option. 
 

Valved Cracker Cell (V-CRC)

The Valved Cracker Cell combines evaporation and cracking of elements with medium vapor pressure. This cell has an integrated valve to reproducibly control and rapidly change the beam flux by more than two orders of magnitude. The valve is located at the orifice and is heated to prevent any condensation of material.
 

Low Temperature Cell (LTC)

The Low Temperature Cell evaporates materials with a high vapor pressure. Crucibles with large capacity allow long lasting operation. The radiation heating system consists of a wire filament and PBN insulators surrounded by a shielding to minimize heat radiation.

Temperature range: 50 – 1200°C
 

Ultra Low Temperature Cell (ULTC)

The Ultra Low Temperature Cell (ULTC) evaporates materials in a very low temperature range. The crucible is surrounded by a cooling coil to reach ultra low temperatures and a heating element to control the flux of the condensed material. The coil is cooled by dry nitrogen.

Temperature range:  -60 – 30 °C

Atomic Hydrogen Source (HLC)

Atomic hydrogen is very reactive and allows the cleaning of various substrates (like GaAs, InP, etc.) at low temperatures. It can also be used for growth of epitaxial layers. Molecular hydrogen gas flows through a tube passing a hot filament which is located at the end of this tube heated up to 2800°C. In this arrangement atomic hydrogen is produced.
 

TUBO Effusion Sources

With temperatures to 2400C, it is capable to evaporate Silicon from the liquid at high growth rates similar to or even exceeding e-beam evaporators. In contrast to e-beam evaporators, however, it offers the stability and reproducibility of a thermocouple controlled effusion source, together with the reliable, ultrahigh purity TUBO design.
 

Dual Filament Cell (DFC)

The Dual Filament Cell evaporates materials with medium vapor pressure. To prevent material condensation, an additional heating unit with an extra thermocouple is installed near the orifice. This allows independent adjustment of the orifice temperature and the main temperature of the effusion cell.

Temperature Range: 
Bulk zone: 50 – 1400 °C
Hot-lip zone: 50 – 1400 °C

Single Filament Cell (SFC)

The Single Filament Cell is designed for evaporation of materials with medium vapor pressure. The radiation heating system consists of a wire filament and PBN insulators surrounded by a shielding to minimize heat radiation. Direct heat transfer from the filament to the crucible reduces the power consumption and gives an excellent control of the flux. A hot-lip filament option is available to avoid condensation at the crucible orifice

Temperature range: 50 –1400 °C

OLED Effusion Cell (OLED)

The OLED Effusion Cell is designed to evaporate organic materials and materials with very high vapor pressure. The heating element with double windings at the orifice avoids re-condensation of material. The integrated water cooling design is optimized for an exact temperature control from ambient temperature up to 800°C.
 
A multi cell version with up to four effusion cells integrated on one flange enables complex processes with a compact application.
 

Cold Lip Cell (CLC)

The CLC is designed for use in a MBE system for evaporation of Aluminium in temperature range up to 1400 °C. The radiation heating system consists of a wire filament and PBN rings for electrical insulation. At the orifice, the heating system is reduced (cold lip) to avoid the flow out of Al. The heating system and the temperature measurement are optimized to accurately control the temperature range between 1000 and 1200 °C. The cell can only be used with a PBN crucible.

Electron Beam Evaporator (EBE)

The Electron Beam Evaporator is designed for evaporation of low vapor pressure materials – either from wire, rod or crucible – under true UHV conditions. The heating of the material is performed by electron beam bombardment to a temperature of 2700°C.

The EBE-C version is used for carbon doping in MBE applications. A pyrolytic graphite rod is heated by electron bombardment to a maximum temperature (2300°C) to evaporate elemental carbon of highest purity. The design prevents any ionized species leaving the source. 

The film thickness can be controlled by a rate monitor and a shutter.

Evaporation form rod or 0,8 cc crucible, pyrolitic graphite rod, 4/5 cc crucible and 7/15 cc crucible.

Cracker Cell (CRC)

The Cracker Cell integrates evaporation and cracking of materials that are typically evaporated as molecules. By cracking these molecules it is possible to achieve smaller molecules. A special heating system is attached to the top of the cell for much higher temperatures than the evaporation temperature.
 
Special insulation parts are used to minimize crosstalk between the two heating stages. Each heating stage is separately adjustable and has its own thermocouple. The crucible and the cracking insert are designed in such a way that the evaporated material has to flow through the cracking zone. The design and number of inserts can vary.

Decomposition Effusion Cell (DECO-P)

The Decomposition Effusion Cell is designed to generate ultra-pure phosphorus (P2) by decomposition of gallium phosphide (GaP | purity > 6 N). The use is similar to a standard effusion cell, where the source material is loaded into the crucible and evaporated by heating the crucible via radiation heating stage. Because of the incongruent evaporation of GaP, the P2 is generated by a lower temperature compared to Ga. Therefore, the Ga remains stable inside the crucible, while the P2 comes out of the effusion cell at the orifice. To avoid the Ga atoms to flow out of the cell with the P2 beam out, there is a Ga trapping cap at the orifice. This ensures that no Ga atoms can leave the effusion cell.


The ratio P2: Ga in the P2 molecular beam is approx. 1:10-5, by using the Ga trapping cap.
An extra valve above the Ga trapping cap is available to lower the beam intensity. This valve allows shutting ON and OFF the P2 beam in a very short time in a ratio approx. 1:10. This version of a P2 source is an affordable and easily operated alternative to valved phosphorus sources.

Decomposition Effusion Cell (DECO-As)

The Decomposition Effusion Cell is designed to generate ultra-pure arsenic (As2) by decomposition of gallium arsenide (GaAs | purity > 6 N). The use is similar to a standard effusion cell, where the source material is loaded into the crucible and evaporated by heating the crucible via radiation heating stage.

Because of the incongruent evaporation of GaAs, the As2 is generated by a lower temperature compared to Ga. Therefore, the Ga remains stable inside the crucible, while the As2 comes out of the effusion cell at the orifice. To avoid the Ga atoms to flow out of the cell with the As2 beam out, there is a Ga trapping cap at the orifice. This ensures that no Ga atoms can leave the effusion cell.


The ratio As2: Ga in the As2 molecular beam is approx. 1:10-5, by using the Ga trapping cap.
An extra valve above the Ga trapping cap is available to lower the beam intensity. This valve allows shutting ON and OFF the As2 beam in a very short time in a ratio approx. 1:10. This version of As2 source is an affordable and easily operated alternative to valved arsenide sources.