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MBE Systems

MBE, PVD and LT-STM/AFM

CreaTec Fischer & Co. GmbH designs and manufactures Molecular Beam Epitaxy (MBE), Physical Vapor Deposition (PVD) systems and accessories. Products includes evaporation sources, effusion cells, electron beam evaporators, atomic hydrogen source, RHEED and RHEED software.

 

Since 2000, the Low-Temperature Scanning Tunneling Microscope (LT-STM) is an essential part of CreaTec’s product range; now with three different scanning probe systems: 4K LT-STM/AFM, a combined 4K LT-STM/AFM and a 1K LT-STM/AFM system. All these microscopes offer ultimate STM, STS and IETS performance including one of the longest LHe hold times, extremely low drift rates and outstanding stability.

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ARC Sciences Pte Ltd

12 Lorong Bakar Batu, #06-07 Singapore 348745

sales@arcsciences.com.sg

+65 6296 7828

Systems Equipment

Thin Film Deposition
Surface Analysis
PTR-MS
Glovebox Solutions
Hydrogen Generators

Materials & Consumables

ALD/CVD Precursor

Evaporation Sources

Sputter Targets

Substrates

UHV Accessories

Vacuum Pumps

Vacuum Guage & RGA

UHV Components

Chambers

Feedthrough

Motion and Manipulators

Viewports and Doors

Valves

Bellows and Flexible Hoses

Mini MBE System

The MiniMBE System is specially designed for epitaxial growth on small sample sizes in combination with a reduced size of the system. The system consists of the growth chamber for growing layers by MBE, a load-lock chamber and an optional buffer chamber. The growth chamber contains effusion cells, manipulator, cooling units, transfer to the load-lock chamber, pumping equipment and other necessary instruments.

Features:
  • Optimized pumping configuration
  • Face-down zero force substrate transfer
  • Linear shutters and substrate rotation
  • Substrate heater option available
  • Up to 11 effusion cells
  • CF 63 central multifunctional port (e.g. standard sources)
  • Main shutter
  • Flux gauge / QCM
  • RHEED

Low Temperature Cell (LTC)

The Low Temperature Cell evaporates materials with a high vapor pressure. Crucibles with large capacity allow long lasting operation. The radiation heating system consists of a wire filament and PBN insulators surrounded by a shielding to minimize heat radiation.

Temperature range: 50 – 1200°C
 

Ultra Low Temperature Cell (ULTC)

The Ultra Low Temperature Cell (ULTC) evaporates materials in a very low temperature range. The crucible is surrounded by a cooling coil to reach ultra low temperatures and a heating element to control the flux of the condensed material. The coil is cooled by dry nitrogen.

Temperature range:  -60 – 30 °C

Atomic Hydrogen Source (HLC)

Atomic hydrogen is very reactive and allows the cleaning of various substrates (like GaAs, InP, etc.) at low temperatures. It can also be used for growth of epitaxial layers. Molecular hydrogen gas flows through a tube passing a hot filament which is located at the end of this tube heated up to 2800°C. In this arrangement atomic hydrogen is produced.
 

TUBO Effusion Sources

With temperatures to 2400C, it is capable to evaporate Silicon from the liquid at high growth rates similar to or even exceeding e-beam evaporators. In contrast to e-beam evaporators, however, it offers the stability and reproducibility of a thermocouple controlled effusion source, together with the reliable, ultrahigh purity TUBO design.